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3D Nanomanufacturing

The target of this technology platform is to develop concepts and instruments for nanopatterning, nanomanufacturing and nanomanipulation of structures below 10 nm. Examples are scanning probe nanolithography, which enables mask-less patterning of structures with sizes down to few nanometres. Another example is the development of an instrument based on STimulated Emission Depletion (STED) lithography which enables fabrication of 3 dimensional structures in resist, without a mask, with dimensions much smaller than the optical diffraction limit.